ASTM-E684 › Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces (Withdrawn 2012)
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Scope
1.1 This practice describes a simple and approximate method for determining the shape and current density of ion beams. The practice is limited to ion beams of diameter greater than 0.5 mm of the type used for sputtering of solid surfaces to obtain sputter depth profiles. It is assumed that the ion-beam current density is symmetrical about the beam axis.
1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
Significance and Use
Sputter depth profiling is used in conjunction with Auger electron spectroscopy, x-ray photoelectron spectroscopy, ion scattering spectroscopy, and secondary ion mass spectrometry to determine the chemical composition and atomic concentration as a function of distance from the surface of a specimen. See Guide E 1127
The diameter of the ion beam used for sputtering must be specified and this practice is a relatively quick method of measuring the shape (that is, current density distribution) of the ion beam if a suitable Faraday cup is not available.3
Keywords
ion beam sputtering; ICS Number Code 17.220.20 (Measurement of electrical and magnetic quantities)
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03.06 (Molecular Spectroscopy; Surface Analysis)
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Document Number
ASTM-E684-04
Revision Level
2004 EDITION
Status
Superseded
Modification Type
Replaced
Publication Date
Nov. 1, 2004
Document Type
Practice
Page Count
2 pages
Committee Number
E42.08