ASTM-F154 › Historical Revision Information
Identification of Structures & Contaminants Seen on Specularsilicon Surfaces, Standard Gu
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Scope
1.1 The purpose of this guide is to list, illustrate, and provide reference for various characteristic features and contaminants that are seen on highly specular silicon wafers. Recommended practices for delineation and observation of these artifacts are referenced. The artifacts described in this guide are intended to parallel and support the content of the SEMI M18. These artifacts and common synonyms are arranged alphabetically in Tables 1 and 2 and illustrated in Figs. 1-68 .
Keywords
contaminant; defects; dislocation; epitaxial; fracture; preferential etch; scratch; shallow pit; silicon; slip; stacking fault; ICS Number Code 17.040.20 (Properties of surfaces)
To find similar documents by ASTM Volume:
10.04 (Electronics; Declarable Substances in Materials; 3D Imaging Systems)
To find similar documents by classification:
17.040.20 (Properties of surfaces)
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Document Number
ASTM-F154-94
Revision Level
1994 EDITION
Status
Superseded
Modification Type
Revision with Title Change
Publication Date
July 15, 1994
Document Type
Guide
Page Count
20 pages
Committee Number
F01.06