BS-ISO-17109 › Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin films
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Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin films
Keywords
Calibration;Depth;Thin films;Surfaces;Spectroscopy;X-ray photoelectron spectroscopy;Measurement;Photoelectron spectroscopy;Films (states of matter);Auger electron spectroscopy;Chemical analysis and testing;Ions;Analysis
To find similar documents by classification:
71.040.40 (Chemical analysis Including analysis of gases and surface chemical analysis)
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Document Number
BS ISO 17109:2022
Revision Level
2022 EDITION
Status
Current
Publication Date
March 31, 2022
Replaces
BS ISO 17109:2015
Page Count
32
ISBN
9780539191257
International Equivalent
ISO 17109:2022
Committee Number
CII/60