BS-ISO-17109-TC › Tracked Changes. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin films
BS-ISO-17109-TC
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2022 EDITION
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CURRENT
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Tracked Changes. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin films
Keywords
Depth;Auger electron spectroscopy;Photoelectron spectroscopy;Films (states of matter);Ions;Measurement;Analysis;X-ray photoelectron spectroscopy;Thin films;Calibration;Surfaces;Spectroscopy;Chemical analysis and testing
To find similar documents by classification:
71.040.40 (Chemical analysis Including analysis of gases and surface chemical analysis)
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Document Number
BS ISO 17109:2022 - TC
Revision Level
2022 EDITION
Status
Current
Publication Date
Jan. 3, 2023
Page Count
68
ISBN
9780539242546
Committee Number
CII/60