ISO-14237 › Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
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ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.
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71.040.40 (Chemical analysis Including analysis of gases and surface chemical analysis)
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Document Number
ISO 14237:2010
Revision Level
2ND EDITION
Status
Current
Publication Date
July 15, 2010
Committee Number
ISO/TC 201/SC 6