ISO-23170 › Surface chemical analysis - Depth profiling - Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

ISO-23170 - 1ST EDITION - CURRENT


Document Center Inc. is an authorized dealer of ISO standards.
The following bibliographic material is provided to assist you with your purchasing decision:


This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

ORDER

Price:

$188.18        


Want this as a site license?

To find similar documents by classification:

71.040.40 (Chemical analysis Including analysis of gases and surface chemical analysis)

This document comes with our free Notification Service, good for the life of the document.

This document is available in either Paper or PDF format.

Document Number

ISO 23170:2022

Revision Level

1ST EDITION

Status

Current

Publication Date

June 1, 2022

Committee Number

ISO/TC 201/SC 4