ASTM-E2444 Standard Terminology Relating to Measurements Taken on Thin, Reflecting Films

ASTM-E2444 - 2011 R18 EDITION - CURRENT
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Standard Terminology Relating to Measurements Taken on Thin, Reflecting Films
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Scope

1.1 This standard consists of terms and definitions pertaining to measurements taken on thin, reflecting films, such as found in microelectromechanical systems (MEMS) materials. In particular, the terms are related to the standards in Section 2, which were generated by Committee E08 on Fatigue and Fracture. Terminology E1823 Relating to Fatigue and Fracture Testing is applicable to this standard.

1.2 The terms are listed in alphabetical order.

1.3 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

Keywords

cantilevers; definitions; fixed-fixed beams; interferometry; length measurements; microelectromechanical systems; MEMS; polysilicon; residual strain; stiction; strain gradient; terminology; test structure;; ICS Number Code 01.040.31 (Electronics (Vocabularies)); 31.240 (Mechanical structures for electronic equipment)

To find similar documents by ASTM Volume:

03.01 (Metals -- Mechanical Testing; Elevated and Low-Temperature Tests; Metallography)

To find similar documents by classification:

01.040.31 (Electronics (Vocabularies))

31.240 (Mechanical structures for electronic equipment)

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Document Number

ASTM-E2444-11(2018)

Revision Level

2011 R18 EDITION

Status

Current

Modification Type

Reapproval

Publication Date

May 1, 2018

Document Type

Terminology

Page Count

2 pages

Committee Number

E08.02