ASTM-F1367 › Standard Specification for Chromium Sputtering Targets for Thin Film Applications
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This specification covers sputtering targets fabricated from chromium metal for use in thin film applications. The grades of chromium covered in this specification, are based on the total metallic impurity content of the metallic elements, and are classified as 4N, 3N7, 3N5, 3N, and 2N8. Materials shall be tested using analytical methods such as combustion/infrared spectrometry, thermal conductivity, atomic absorption spectrometry, direct current plasma, inductively coupled plasma, and spark source mass spectroscopy or glow discharge mass spectroscopy; and the individual grades shall conform to specified values of chemical composition, density, grain size.
Scope
1.1 This specification covers sputtering targets fabricated from chromium metal.
1.2 This specification sets purity grade levels, physical attributes, analytical methods and packaging requirements.
1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.
Keywords
chromium; sputtering; targets; Chromium electronic materials/applications; Chromium sputtering targets; Electronic materials/applications--specifications; Sputtering process/targets--specifications; Targets; ICS Number Code 25.220.40 (Metallic coatings)
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Document Number
ASTM-F1367-98(2011)
Revision Level
1998 R11 EDITION
Status
Current
Modification Type
Reapproval
Publication Date
July 1, 2011
Document Type
Specification
Page Count
2 pages
Committee Number
F01.17