ASTM-F3192 Standard Specification for High-Purity Copper Sputtering Target Used for Through-Silicon Vias (TSV) Mettalization (Withdrawn 2023)

ASTM-F3192 - 2016 EDITION - CANCELLED
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This specification establishes the generic criteria requirements of high pure copper sputtering targets used as thin film material for through-silicon vias (TSV) metallization in advanced packaging. It covers purity (metallic and non-metallic element impurities), grain size, inner quality (internal defect), bonding (backing plate, bonding ratio), configuration (dimension, tolerance, surface roughness), and appearance (surface cleanness). It also includes sampling, traceability, reliability, certification, and packaging requirements.

Scope

1.1 This specification details the generic criteria requirements of high pure copper sputtering targets used as thin film material for through-silicon vias (TSV) metallization in advanced packaging.

1.2 Sputtering target purity, grain size, inner quality, bonding, dimension, and appearance specifications are included in this specification along with references for qualification test methods. Reliability, certification, traceability, and packaging requirements are also included.

1.2.1 Purity Requirements: 

1.2.1.1 Metallic element impurities, and

1.2.1.2 Non-metallic element impurities.

1.2.2 Grain Size Requirements—Grain size.

1.2.3 Inner Quality Requirements—Internal defect.

1.2.4 Bonding Requirements: 

1.2.4.1 Backing plate, and

1.2.4.2 Bonding ratio.

1.2.5 Configuration Requirements: 

1.2.5.1 Dimension,

1.2.5.2 Tolerance, and

1.2.5.3 Surface roughness.

1.2.6 Appearance Requirements—Surface cleanness.

1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.

1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Keywords

high-purity copper; sputtering target; TSV metallization;

To find similar documents by ASTM Volume:

10.04 (Electronics; Declarable Substances in Materials; 3D Imaging Systems)

To find similar documents by classification:

25.220.40 (Metallic coatings Including electrolytic depositions, cathodic coatings, autocatalytic coatings, etc.)

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Document Number

ASTM-F3192-16

Revision Level

2016 EDITION

Status

Cancelled

Modification Type

Withdrawn

Publication Date

Oct. 15, 2016

Document Type

Specification

Page Count

5 pages

Committee Number

F01.17