ASTM-F817 Test Method for Characterization of Film Resistor Materials and Processes (Withdrawn 1996)

ASTM-F817 - 1983 EDITION - CANCELLED
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Test Method for Characterization of Film Resistor Materials and Processes (Withdrawn 1996)

Scope

1.1 This method determines a characteristic equation that describes the overall characteristics of a resistor material and the process used to produce thick or thin film resistors.

1.2 This method provides two linear, statistical models for characterizing film resistors that are simple rectangles. Both models are derived from a common, ideal model for a rectangular film resistor.

1.3 This method describes a characterization of resistor material and processing that has been used to design a number of hybrid microcircuits without trial-and-error design for the resistors.

1.4 This standard may involve hazardous materials, operations, and equipment. This standard does not purport to address all of the safety problems associated with its use. It is the responsibility of whoever uses this standard to consult and establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Keywords

Diffusion; Electrical conductors-semiconductors; Film resistors; Linwood least squares test; Microcircuits; Resistance and resistivity (electrical)-semiconductors; Resistors-film; Statistical methods-electronic components/devices; film resistor (thick/thin) materials/processes-characterization, test

To find similar documents by ASTM Volume:

10.04 (Electronics; Declarable Substances in Materials; 3D Imaging Systems)

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Document Number

ASTM-F817-83(1990)

Revision Level

1983 EDITION

Status

Cancelled

Modification Type

Withdrawn

Publication Date

May 27, 1983

Document Type

Test Method

Page Count

16 pages

Committee Number

F01.90