BS-EN-62047-16 › Semiconductor devices. Micro-electromechanical devices. Test methods for determining residual stresses of MEMS films. Wafer curvature and cantilever beam deflection methods
The following bibliographic material is provided to assist you with your purchasing decision:
Integrated circuits, Electronic equipment and components, Vocabulary, Terminology, Semiconductor technology, Semiconductor devices, Electromechanical devices
To find similar documents by classification:
This document comes with our free Notification Service, good for the life of the document.
This document is available in Paper format.
BS EN 62047-16:2015
July 31, 2015
EN 62047-16:2015 IEC 62047-16:2015