ISO-15969 › Surface chemical analysis - Depth profiling - Measurement of sputtered depth
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This document provides guidelines for measuring the sputtered depth in sputtered depth profiling.
The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.
To find similar documents by classification:
71.040.40 (Chemical analysis Including analysis of gases and surface chemical analysis)
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Document Number
ISO/TR 15969:2021
Revision Level
2ND EDITION
Status
Current
Publication Date
March 1, 2021
Committee Number
ISO/TC 201/SC 4