ISO-17331 › Surface chemical analysis - Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
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1ST EDITION - May 15, 2004
FOR 1ST EDITION AMENDMENT 1 SEE - July 15, 2010
FOR 1ST EDITION AMENDMENT 1 SEE - July 15, 2010
ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method.
It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.
To find similar documents by classification:
71.040.40 (Chemical analysis Including analysis of gases and surface chemical analysis)
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Document Number
ISO 17331:2004
Revision Level
1ST EDITION
Status
Current
Publication Date
May 15, 2004
Committee Number
ISO/TC 201