ISO-21466 › Microbeam analysis - Scanning electron microscopy - Method for evaluating critical dimensions by CD-SEM
ISO-21466
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1ST EDITION
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CURRENT
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This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.
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Document Number
ISO 21466:2019
Revision Level
1ST EDITION
Status
Current
Publication Date
Dec. 1, 2019
Committee Number
ISO/TC 202/SC 4