ISO-21466 Microbeam analysis - Scanning electron microscopy - Method for evaluating critical dimensions by CD-SEM

ISO-21466 - 1ST EDITION - CURRENT


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This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.

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Document Number

ISO 21466:2019

Revision Level

1ST EDITION

Status

Current

Publication Date

Dec. 1, 2019

Committee Number

ISO/TC 202/SC 4