ISO-21859 › Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

ISO-21859 - 1ST EDITION - CURRENT


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This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

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Document Number

ISO 21859:2019

Revision Level

1ST EDITION

Status

Current

Publication Date

June 1, 2019

Committee Number

ISO/TC 206