ASTM-E2246 › Historical Revision Information
Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer
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Scope
1.1 This test method covers a procedure for measuring the strain gradient in thin, reflecting films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an optical interferometer, also called an interferometric microscope. Measurements from cantilevers that are touching the underlying layer are not accepted.
1.2 This test method uses a non-contact optical interferometric microscope with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
Significance and Use
5.1 Strain gradient values are an aid in the design and fabrication of MEMS devices.
Keywords
cantilevers; combined standard uncertainty; fixed-fixed beams; interferometry; length measurements; microelectromechanical systems; MEMS; polysilicon; residual strain; round robin; stiction; strain gradient; test structure; ICS Number Code 37.040.20 (Photographic paper, film and plates. Cartridges)
To find similar documents by ASTM Volume:
03.01 (Metals -- Mechanical Testing; Elevated and Low-Temperature Tests; Metallography)
To find similar documents by classification:
37.040.20 (Photographic paper, films and plates. Cartridges)
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Document Number
ASTM-E2246-11e1
Revision Level
2011(E1) EDITION
Status
Superseded
Modification Type
Editorially changed
Publication Date
Oct. 1, 2013
Document Type
Test Method
Page Count
21 pages
Committee Number
E08.05