ASTM-F1709 › Historical Revision Information
Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

ASTM-F1709 - 1997 R02 EDITION - SUPERSEDED
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Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2023)
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Scope

1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.

1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.

Keywords

coating; sputtering; target; thin film; titanium; ICS Number Code 31.120 (Electronic display devices)

To find similar documents by ASTM Volume:

10.04 (Electronics; Declarable Substances in Materials; 3D Imaging Systems)

To find similar documents by classification:

31.120 (Electronic display devices Including liquid crystal displays)

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Document Number

ASTM-F1709-97(2002)

Revision Level

1997 R02 EDITION

Status

Superseded

Modification Type

Reapproval

Publication Date

Dec. 1, 2002

Document Type

Specification

Page Count

3 pages

Committee Number

F01.17