ASTM-F817 › Historical Revision Information
Characterization of Film Resistor Materials & Processes, Standard Method For
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Scope
1.1 This method determines a characteristic equation that describes the overall characteristics of a resistor material and the process used to produce thick or thin film resistors.
1.2 This method provides two linear, statistical models for characterizing film resistors that are simple rectangles. Both models are derived from a common, ideal model for a rectangular film resistor.
1.3 This method describes a characterization of resistor material and processing that has been used to design a number of hybrid microcircuits without trial-and-error design for the resistors.
1.4 This standard may involve hazardous materials, operations, and equipment. This standard does not purport to address all of the safety problems associated with its use. It is the responsibility of whoever uses this standard to consult and establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
Keywords
Diffusion; Electrical conductors-semiconductors; Film resistors; Linwood least squares test; Microcircuits; Resistance and resistivity (electrical)-semiconductors; Resistors-film; Statistical methods-electronic components/devices; film resistor (thick/thin) materials/processes-characterization, test
To find similar documents by ASTM Volume:
10.04 (Electronics; Declarable Substances in Materials; 3D Imaging Systems)
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This document is available in Paper format.
Document Number
ASTM-F817-83(1990)
Revision Level
1983 EDITION
Status
Cancelled
Modification Type
Withdrawn
Publication Date
May 27, 1983
Document Type
Test Method
Page Count
16 pages
Committee Number
F01.90