ASTM-F1710 Historical Revision Information
Standard Test Method for Trace Metallic Impurities in Electronic Grade Titanium by High Mass-Resolution Glow Discharge Mass Spectrometer

ASTM-F1710 - 1997 R02 EDITION - SUPERSEDED
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Standard Test Method for Trace Metallic Impurities in Electronic Grade Titanium by High Mass-Resolution Glow Discharge Mass Spectrometer (Withdrawn 2023)
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Scope

1.1 This test method covers the determination of concentrations of trace metallic impurities in high purity titanium.

1.2 This test method pertains to analysis by magnetic-sector glow discharge mass spectrometer (GDMS).

1.3 The titanium matrix must be 99.9 weight percent (3N-grade) pure, or purer, with respect to metallic impurities. There must be no major alloy constituent, for example, aluminum or iron, greater than 1000 weight ppm in concentration.

1.4 this test method does not include all the information needed to complete GDMS analyses. Sophisticated computer-controlled laboratory equipment skillfully used by an experienced operator is required to achieve the required sensitivity. This test method does cover the particular factors (for example, specimen preparation, setting of relative sensitivity factors, determination of sensitivity limits, etc.) known by the responsible technical committee to effect the reliability of high purity titanium analyses.

1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Significance and Use

This test method is intended for application in the semiconductor industry for evaluating the purity of materials (for example, sputtering targets, evaporation sources) used in thin film metallization processes. This test method may be useful in additional applications, not envisioned by the responsible technical committee, as agreed upon between the parties concerned.

This test method is intended for use by GDMS analysts in various laboratories for unifying the protocol and parameters for determining trace impurities in pure titanium. The objective is to improve laboratory to laboratory agreement of analysis data. This test method is also directed to the users of GDMS analyses as an aid to understanding the determination method, and the significance and reliability of reported GDMS data.

For most metallic species the detection limit for routine analysis is on the order of 0.01 weight ppm. With special precautions detection limits to sub-ppb levels are possible.

This test method may be used as a referee method for producers and users of electronic-grade titanium materials.

Keywords

electronics; glow discharge mass spectrometer (GDMS); purity analysis; sputtering target; titanium; trace metallic impurities; ICS Number Code 71.040.50 (Physicochemical methods of analysis); 77.040.99 (Other methods of testing metals)

To find similar documents by ASTM Volume:

10.04 (Electronics; Declarable Substances in Materials; 3D Imaging Systems)

To find similar documents by classification:

71.040.50 (Physicochemical methods of analysis Including spectrophotometric and chromatographic analysis)

77.040.99 (Other methods of testing of metals)

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Document Number

ASTM-F1710-97(2002)

Revision Level

1997 R02 EDITION

Status

Superseded

Modification Type

Reapproval

Publication Date

Dec. 10, 2002

Document Type

Test Method

Page Count

6 pages

Committee Number

F01.17