ASTM-F416 › Historical Revision Information
Test Method for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 1998)
ASTM-F416
-
1988 EDITION
-
SUPERSEDED
-- See the following:
ASTM-F1727
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Test Method for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 1998)
Keywords
ICS Number Code 29.045 (Semiconducting materials)
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29.045 (Semiconducting materials)
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Document Number
ASTM-F416-88
Revision Level
1988 EDITION
Status
Superseded
Modification Type
Replaced
Publication Date
Oct. 31, 1988
Document Type
Test Method
Page Count
10 pages