ASTM-F416 › Historical Revision Information
Test Method for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 1998)

ASTM-F416 - 1994 EDITION - SUPERSEDED -- See the following: ASTM-F1727
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Test Method for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 1998)
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Keywords

ICS Number Code 29.045 (Semiconducting materials)

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29.045 (Semiconducting materials)

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Document Number

ASTM-F416-94

Revision Level

1994 EDITION

Status

Superseded

Modification Type

Replaced

Publication Date

July 15, 1994

Document Type

Test Method

Page Count

11 pages