ASTM-F2113 › Historical Revision Information
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
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Scope
1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.
1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.
1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
Keywords
electronics; purity analysis; purity grade; sputtering; target; thin film
To find similar documents by ASTM Volume:
10.04 (Electronics; Declarable Substances in Materials; 3D Imaging Systems)
To find similar documents by classification:
29.045 (Semiconducting materials)
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Document Number
ASTM-F2113-01
Revision Level
2001 EDITION
Status
Superseded
Modification Type
New
Publication Date
June 10, 2001
Document Type
Guide
Page Count
2 pages
Committee Number
F01.17